Innovations in Optics’ Post

📌 EPFL authors Damien Maillard, Zdenek Benes, Niccolò Piacentini, and Luis Guillermo Villanueva remind us to keep our options open beyond the typical EBL resist trinity: PMMA, ZEP, and HSQ. In their paper "Electron-beam lithography on M108Y and M35G chemically amplified DUV photoresists," they investigate the use of deep ultraviolet (DUV) resists, M108Y and M35G from JSR Micro, Inc., as EBL resists. Their chemical amplification yields high sensitivity to increase throughput. Moreover, the authors find comparable critical dimensions and better selectivity for pattern transfer into silicon to the standard EBL resists. Read more: https://lnkd.in/eQqFaSHD 🛫 Have you registered for MAEBL yet? https://www.maebl.org #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #litho #workforcedevelopment #semicon #semiconductor #semiconductors #lithography Image source: https://lnkd.in/eQqFaSHD

Quick Take: Photomask Japan 2024 Review - the new $380M ASML equipment to make chips will become mainstay by 2028. The 30th Symposium on Photomask and NGL Mask Technology (Photomask Japan 2024) highlighted the industry's shift towards high-NA EUV lithography. A significant majority (80%) of industry experts surveyed by the eBeam Initiative believe high-NA EUV lithography will reach high-volume manufacturing by 2028. EUV stands for Extreme Ultraviolet, which refers to a type of light with a very short wavelength (13.5 nm). This light is used to "expose" the patterns on the silicon wafer. High-NA stands for High Numerical Aperture, which is a measure of how well a lens can focus light. In this case, the lens has a very high NA (>0.33), allowing it to focus the EUV light to incredibly small spots. #photomask #semiconductors #lithography #EUV #HighNA #PhotomaskJapan2024

𝐓𝐡𝐫𝐨𝐰𝐛𝐚𝐜𝐤 𝐭𝐨 𝐚 𝐠𝐫𝐞𝐚𝐭 𝐲𝐞𝐚𝐫 2023 𝐚𝐭 𝐂𝐨𝐧𝐟𝐨𝐯𝐢𝐬 Now that the year is coming to an end and it’s beginning to look a lot like Christmas everywhere we go, we take a look at some great moments of 2023 at Confovis. 🎇 We published 2 whitepapers about the challenges for the optical inspection of glass & compound semiconductor wafers and full 3D defect and anomaly inspection for inline semiconductor manufacturing. 🔹We presented a well-received poster at the 26th edition of the ieee-IITC in Dresden, Germany about a novel solution for detection and classification of anomalies on #compoundsemiconductors. 🔹We prepared new tools and protocols for measuring patterned and unpatterned wafers. 🔹We developed a new platform for 3D defect and anomaly inspection. The WAFERinspect AOI Dual counts with an additional chromatic confocal line sensor from Precitec 3D Metrology which complements the ConfoCam® 2-in-1 scan head. 🔹We implemented the multisensor approach allowing to add multiple sensors on our new platforms but also to retrofit them on existing and operating AOI tools. 🔹We designed and manufactured our first custom-made semiconductor calibration samples. They consist of nano-structured concentric circles etched in silicon called circular chirps. 🔹We addressed many new types of measurements and samples with our clients such as: 3D inspection of micro-lenses for #LiDAR, 100% optical inspection of interposers for #advancedpackaging, wafer mapping of micro-bumps for thermal compression bonding, on-the-fly #metrology of #VCSEL wafers, detection of surface and embedded defects in transparent thin films and substrates. 

New to Nanoimprint Lithography (NIL) or seeking to optimise your development? Here is everything you need to know about rolling NIL >>> Regardless of your experience level, selecting the right nano replication method can be daunting… Different projects have specific requirements, and our specialists are here to support your unique vision. With 20+ years of experience collaborating with worldwide partners, we offer high-quality, advanced nanoimprinting solutions tailored to your needs. DON'T RISK MAKING THE WRONG CHOICE — whether you're an optical device developer, semiconductor manufacturer, or university researcher, dive into the challenges and benefits of each nanoimprint lithography method in today’s slideshow. Contact our team for a personalised assistance: https://lnkd.in/dz3pXtgy #NanoImprintLithography #UVNIL #Nanostructure #Components #RollToRoll #RollToPlate #NanoReplication #OpticalDevices  #FunctionalSurfaces

𝐍𝐚𝐧𝐨-𝐬𝐭𝐫𝐮𝐜𝐭𝐮𝐫𝐞𝐝 𝐬𝐢𝐥𝐢𝐜𝐨𝐧 𝐜𝐡𝐢𝐫𝐩𝐬 𝐟𝐨𝐫 𝐭𝐡𝐞 𝐜𝐚𝐥𝐢𝐛𝐫𝐚𝐭𝐢𝐨𝐧 𝐨𝐟 𝐚𝐮𝐭𝐨𝐦𝐚𝐭𝐞𝐝 𝐨𝐩𝐭𝐢𝐜𝐚𝐥 𝐢𝐧𝐬𝐩𝐞𝐜𝐭𝐢𝐨𝐧 𝐬𝐲𝐬𝐭𝐞𝐦𝐬 Today we follow up on the devices fabricated by our colleague Alessandro at EPFL (École polytechnique fédérale de Lausanne) by e-beam lithography. The samples consist of nano-structured concentric circles etched in silicon called circular chirps. They are the first #semiconductor #calibration samples dedicated to the determination of the transfer function and topography fidelity of #AOI tools and 3D optical confocal microscopes Automated optical inspection (#AOI) is widely used for quality control in semiconductor manufacturing. For high aspect ratio topographies, large measurement deviations can be observed. To investigate the topography fidelity of optical measurement instruments, a semiconductor chirp calibration standard has been developed within this project based on the German National Metrology Institute standards.

𝗣𝘂𝘀𝗵𝗶𝗻𝗴 𝘁𝗵𝗲 𝗹𝗶𝗺𝗶𝘁𝘀 𝗼𝗳 𝗺𝗶𝗻𝗶𝗮𝘁𝘂𝗿𝗶𝘇𝗮𝘁𝗶𝗼𝗻 Advancements in microelectronics continuously rely on shrinking electronic devices and incorporating novel materials in active regions to achieve ever-higher speeds and new functionalities in device structures. What is our solution? > Precise overlay of multi-layer devices. > Dense patterns with high resolution features and low line edge roughness. > Real-time autofocus enabling sub-micron feature size and consistent uniformity even on corrugated surfaces. Maskless lithography tools like the VPG 300 DI of Heidelberg Instruments have emerged as a transformative technology in microelectronics lithography. Learn more at heidelberg-instruments.com or next week at SEMICON Europa in Munich! Image: Flexible chip film patch, separated from a 150 mm wafer, all layers were exposed with the VPG 300 DI, Courtesy of IMS Chips #flexibleelectronics #printedelectronics #semiconductor #masklesslaserlithography #directwriting

Have you ever heard of a mirrorblock? It enables the precise alignment of the wafer with the mask and projection optics from ZEISS Semiconductor Manufacturing Technology. Even a scratch as wide as 1/10 of a human hair can make the mirrorblock unusable. So a steady hand and absolute precision are a must. Learn more about EUV lithography optics from ZEISS: https://zeiss.ly/euv #ZEISS #Digitalization #Lithography #Microchips

The year is off to a fast start for Pixelligent Technologies! Checkout this recent case study on the critical importance of HRI materials for #extendedreality by our friends at Morphotonics - the leaders in large scale #nil #waveguide manufacturing.

Explore the fascinating world of EUV technology in one of our latest #AdvantestTalksSemi podcast episodes. Discover how Extreme Ultraviolet lithography is revolutionizing semiconductor manufacturing, pushing the boundaries of miniaturization and efficiency. From the intricacies of mask evaluation to the challenges of scaling down to nanometer sizes, get a glimpse into the future of chip fabrication. EUV isn't just a technological leap; it's a gateway to the next era of computing! #EUVTechnology #SemiconductorManufacturing #Nanotech #Advantest #ChipFabrication #TechInnovation #FutureComputing #Semiconductors #AdvantestTalksSemi

Pixelligent Inside? Yes indeed! Bravo to the team at Morphotonics for detailing the extraordinary #innovation involved in #smartglass #optics manufacturing. We are proud that Pixelligent Technologies' high-index #materials contributed to the complex #technologies that enabled the #waveguide optics described in this article. The age of #extendedreality is here and now, with diverse technologies working in concert to enable a new class of feature-rich, lightweight #extendedreality devices. SPIE, the international society for optics and photonics https://lnkd.in/ewTuWKy2