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Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks #toppanphotomaskcompany #photomasks https://lnkd.in/ei48hiCu

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We are very proud to announce that Toppan Photomask has signed an agreement with IBM for joint research and development on EUV semiconductor photomasks!  This collaboration is aimed at advancing the development of EUV photomasks specifically for IBM's 2-nanometer technology designs and marks a significant milestone in the semiconductor industry. Read more about this innovative partnership and its impact on the future of semiconductor technology here:https://lnkd.in/g2dwhA_E. #ToppanPhotomask #IBM #Semiconductor #EUVPhotomasks #Innovation #Collaboration

Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks

Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks

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